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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10320005 B1

PDFFull Text
Date of Patent:
Jun. 11, 2019

Filed:

Mar. 04, 2014

Bismuth-vanadate-laminate manufacturing method and bismuth-vanadate laminate

Applicants:

Tokyo University of Science Foundation, Shinjuku-ku, Tokyo, JP;

Mitsui Chemicals, Inc., Minato-ku, Tokyo, JP;

Japan Technological Research Association of Artificial Photosynthetic Chemical Process, Chiyoda-ku, Tokyo, JP;

Inventors:

Akihiko Kudo, Tokyo, JP;

Qingxin Jia, Tokyo, JP;

Akihide Iwase, Tokyo, JP;

Assignees:

TOKYO UNIVERSITY OF SCIENCE FOUNDATION, Tokyo, JP;

MITSUI CHEMICALS, INC., Tokyo, JP;

JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS, Tokyo, JP;

Attorney:

Cantor Colburn LLP

Primary Examiner:

Marianne L Padgett

Int. Cl.
CPC ...
H05B 6/64 (2006.01); H01M 4/90 (2006.01); C23C 18/12 (2006.01); C23C 18/14 (2006.01); B01J 23/22 (2006.01); B01J 37/34 (2006.01); B01J 23/14 (2006.01); B01J 35/00 (2006.01); C25B 11/04 (2006.01); H01M 4/88 (2006.01); B01J 27/135 (2006.01);
U.S. Cl.
CPC ...
H01M 4/9016 (2013.01); B01J 23/14 (2013.01); B01J 23/22 (2013.01); B01J 27/135 (2013.01); B01J 35/002 (2013.01); B01J 35/004 (2013.01); B01J 37/346 (2013.01); C23C 18/1216 (2013.01); C23C 18/14 (2013.01); C25B 11/0478 (2013.01); H01M 4/8842 (2013.01);
Abstract

A new BiVO-laminate manufacturing method and BiVOlaminate are provided. A bismuth-vanadate laminate is manufactured as follows: a substrate that can be heated by microwaves is disposed inside a precursor solution containing a vanadium salt and a bismuth salt, microwave-activated chemical bath deposition (MW-CBD) is used to form a bismuth-vanadate layer on the substrate, and a firing process is performed as necessary. A bismuth-vanadate laminate manufactured in this way is suitable for use as a photocatalyst or photoelectrode.

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