The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2019

Filed:

Dec. 13, 2016
Applicant:

Hyundai Motor Company, Seoul, KR;

Inventors:

Dae Hwan Chun, Gwangmyeong-si, KR;

Youngkyun Jung, Seoul, KR;

NackYong Joo, Hanam-si, KR;

Junghee Park, Suwon-si, KR;

JongSeok Lee, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 21/265 (2006.01); H01L 21/306 (2006.01); H01L 29/16 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7827 (2013.01); H01L 21/0334 (2013.01); H01L 21/26506 (2013.01); H01L 21/30604 (2013.01); H01L 29/1608 (2013.01); H01L 29/4236 (2013.01); H01L 29/66068 (2013.01); H01L 29/66666 (2013.01);
Abstract

A semiconductor device includes an n+ type silicon carbide substrate, an n− type layer, an n type layer, a plurality of trenches, a p type region, an n+ type region, a gate insulating film, a gate electrode, a source electrode, a drain electrode, and a channel. The plurality of trenches is disposed in a planar matrix shape. The n+ type region is disposed in a planar mesh type with openings, surrounds each of the trenches, and is in contact with the source electrode between the trenches adjacent to each other in a planar diagonal direction. The p type region is disposed in the opening of the n+ type region in a planar mesh type.


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