The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
Feb. 21, 2017
Apple Inc., Cupertino, CA (US);
Chaohao Wang, Cupertino, CA (US);
Paolo Sacchetto, Cupertino, CA (US);
Sheng Zhang, Milpitas, CA (US);
Yang Li, Los Angeles, CA (US);
Myung-Je Cho, San Jose, CA (US);
Marc Albrecht, San Francisco, CA (US);
Apple Inc., Cupertino, CA (US);
Abstract
This application relates to performing certain dithering processes to eliminate display artifacts such as flicker, which can be caused by charge accumulation at the display. The dither process can be performed by a display controller that uses a group lookup method for identifying groups of dithering patterns that can be combined to expand a number of color values available to the display. The dither process can also be performed as a temporal process that incorporates groups of dithering patterns into frames and shifts a spatial arrangement of the groups of dithering patterns over a sequence of frames. Additionally, the dither process can incorporate counters that count the number of times a particular spatial arrangement of dithering patterns has been used in a sequence of frames in order that each spatial arrangement of dithering patterns will share an average count with other spatial arrangements over a sequence of frames.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile