The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
Feb. 02, 2017
Arkansas State University—jonesboro, State University, AR (US);
Hideya Koizumi, Jonesboro, AR (US);
Kenichiro Saito, Tokyo, JP;
Arkansas State University—Jonesboro, Jonesboro, AR (US);
Abstract
The system effectively manipulates the operation of a charged particle flow device by approximating the total force on each ion during a trajectory calculation. The system applies the method in massively parallel general-purpose computing with GPU (GPGPU) to test its performance in simulations with thousands to over a million ions. The method calculates the forces on an ion using ions within an active region near the ion of interest. To decrease computation time, the method approximates the forces by calculating the ion-ion interactions within a first zone and the ion-ion cloud interactions within a second zone. The system adjusts settings of the charged particle flow device to affect the flow and positioning of the charged particles. Such setting may include adjusting the positioning of the charged plates, adjusting the voltage of the plates, and adjusting the pressure within the charged particle flow device.