The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
Jul. 01, 2014
Applicant:
Honeywell International Inc., Morristown, NJ (US);
Inventors:
Kalluri R. Sarma, Mesa, AZ (US);
John F. L. Schmidt, Phoenix, AZ (US);
Assignee:
HONEYWELL INTERNATIONAL INC., Morris Plains, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/18 (2015.01); C03C 17/23 (2006.01); B01J 27/24 (2006.01); B01J 35/02 (2006.01); G02B 1/12 (2006.01); G06F 3/041 (2006.01);
U.S. Cl.
CPC ...
G02B 1/18 (2015.01); B01J 27/24 (2013.01); B01J 35/02 (2013.01); C03C 17/23 (2013.01); G02B 1/12 (2013.01); G06F 3/041 (2013.01); C03C 2204/08 (2013.01); C03C 2217/212 (2013.01); C03C 2217/23 (2013.01); C03C 2217/477 (2013.01); C03C 2217/71 (2013.01); C03C 2217/77 (2013.01); C03C 2218/31 (2013.01);
Abstract
Apparatus for a smudge-resistant structure and related fabrication methods are provided. An exemplary smudge-resistant structure includes a transparent substrate having a macrostructured surface configured to reduce contact with the transparent substrate and an oxidizing layer overlying the macrostructured surface.
Sarma, Kalluri. (2019). Self-cleaning smudge-resistant structure and related fabrication methods (U.S. Patent No. 10317578). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10317578
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile