The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
Mar. 10, 2015
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Hideki Matsumoto, Utsunomiya, JP;
Tomonobu Saku, Utsunomiya, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 43/02 (2006.01); B29C 43/56 (2006.01); B29C 59/02 (2006.01); H01L 21/683 (2006.01); G11B 5/855 (2006.01); B29C 31/00 (2006.01); B29C 59/00 (2006.01); H01L 21/67 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B29C 59/026 (2013.01); B29C 31/008 (2013.01); B29C 43/56 (2013.01); B29C 59/002 (2013.01); G03F 7/0002 (2013.01); G11B 5/855 (2013.01); H01L 21/6715 (2013.01); H01L 21/6838 (2013.01); B29C 43/021 (2013.01); B29C 59/022 (2013.01); B82Y 40/00 (2013.01);
Abstract
An imprint apparatus includes a nozzle including a discharge outlet which discharges imprint material onto the substrate, a supply unit configured to supply a gas which accelerates filling of a pattern of a mold with the imprint material, and a gas unit provided with the nozzle. The gas unit performs gas supply or exhaust with respect to a second space around a first space between the nozzle and a portion of the substrate which faces the nozzle and is conveyed under the nozzle in order to suppress the gas from flowing into the first space.