The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2019

Filed:

Dec. 22, 2015
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Masayoshi Fujimoto, Utsunomiya, JP;

Takuro Yamazaki, Utsunomiya, JP;

Tomomi Funayoshi, Utsunomiya, JP;

Hiromitsu Yamaguchi, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); B29C 43/58 (2006.01); G03F 7/00 (2006.01); B29C 43/02 (2006.01); B29C 33/42 (2006.01); B29L 31/34 (2006.01); B29K 105/24 (2006.01); B29C 35/08 (2006.01);
U.S. Cl.
CPC ...
B29C 43/58 (2013.01); G03F 7/0002 (2013.01); B29C 33/424 (2013.01); B29C 43/021 (2013.01); B29C 2035/0827 (2013.01); B29C 2043/5833 (2013.01); B29C 2043/5891 (2013.01); B29K 2105/246 (2013.01); B29L 2031/34 (2013.01);
Abstract

The present invention provides an imprint apparatus which forms a pattern in an imprint material on a substrate by using a mold, the apparatus including a tilt unit configured to tilt the mold and the substrate relatively, a detection unit configured to detect an interference pattern between light reflected by the mold and light reflected by the substrate, and a control unit configured to control, based on the interference pattern detected by the detection unit in a state in which the mold and the imprint material on the substrate are in contact with each other, the tilt unit to reduce relative tilts between the mold and the substrate in the state.


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