The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
Apr. 20, 2017
O&m Halyard, Inc., Mechanicsville, VA (US);
Prasad S. Potnis, Johns Creek, GA (US);
Christena K. Nash, Alpharetta, GA (US);
Eric C. Steindorf, Roswell, GA (US);
Ajay Y. Houde, Johns Creek, GA (US);
Joseph D. Hurdle, Canton, GA (US);
O&M Halyard, Inc., Mechanicsville, VA (US);
Abstract
A multi-layered face mask coated with discontinuous patterns of phase change material are incorporated into the face mask construction to provide for cooling of the microclimate in the dead space of the face mask. Optimized cooling is achieved by strategic placement of layers coated with a phase change material within the mask construction and the amount and density of the phase change material in contact with the temperature sensitive areas of the face, as well as areas experiencing the maximum amount of flux from exhaled breath. The shape of the mask can also be adjusted to increase skin contact with the phase change material and decrease dead space volume, which reduces the volume of warm exhaled air and can provide sufficient cooling with less phase change material. The discontinuous patterns of phase change material also provide inter-layer spacing between the layers of the mask, which can improve splash resistance.