The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Jun. 04, 2018
Applicant:

Oclaro Japan, Inc., Kanagawa, JP;

Inventors:

Takeshi Kitatani, Tokyo, JP;

Kaoru Okamoto, Kanagawa, JP;

Kouji Nakahara, Tokyo, JP;

Assignee:

Oclaro Japan, Inc., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/00 (2006.01); H01S 5/32 (2006.01); H01S 5/30 (2006.01); H01S 5/026 (2006.01); H01S 5/22 (2006.01); H01S 5/343 (2006.01); H01S 5/042 (2006.01); H01S 5/02 (2006.01); H01S 5/12 (2006.01); H01S 5/34 (2006.01);
U.S. Cl.
CPC ...
H01S 5/3218 (2013.01); H01S 5/026 (2013.01); H01S 5/0208 (2013.01); H01S 5/0425 (2013.01); H01S 5/12 (2013.01); H01S 5/22 (2013.01); H01S 5/305 (2013.01); H01S 5/3054 (2013.01); H01S 5/3063 (2013.01); H01S 5/3072 (2013.01); H01S 5/3201 (2013.01); H01S 5/343 (2013.01); H01S 5/3403 (2013.01); H01S 5/3432 (2013.01); H01S 5/34366 (2013.01);
Abstract

An optical semiconductor device includes an InP substrate; an active layer disposed above the InP substrate; a n-type semiconductor layer disposed below the active layer; and a p-type clad layer disposed above the active layer, wherein the p-type clad layer includes one or more p-type InAlP layers, the Al composition x of each of the one or more p-type InAlP layers is equal to or greater than a value corresponding to the doping concentration of a p-type dopant, and the absolute value of the average strain amount of the whole of the p-type clad layer is equal to or less than the absolute value of a critical strain amount obtained by Matthews' relational expression, using the entire layer thickness of the whole of the p-type clad layer as a critical layer thickness.


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