The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Apr. 26, 2014
Applicant:

Hitachi Chemical Company, Ltd., Chiyoda-ku, Tokyo, JP;

Inventors:

Youichi Machii, Tsukuba, JP;

Masato Yoshida, Tsukuba, JP;

Takeshi Nojiri, Tsukuba, JP;

Kaoru Okaniwa, Tsukuba, JP;

Mitsunori Iwamuro, Tsukuba, JP;

Shuichiro Adachi, Tsukuba, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/18 (2006.01); H01L 31/0224 (2006.01); H01L 21/22 (2006.01); H01L 21/225 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1864 (2013.01); H01L 21/2225 (2013.01); H01L 21/2255 (2013.01); H01L 31/022425 (2013.01); H01L 31/1804 (2013.01); Y02E 10/547 (2013.01); Y02P 70/521 (2015.11);
Abstract

The composition for forming a p-type diffusion layer in accordance with the present invention contains an acceptor element-containing glass powder and a dispersion medium. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.


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