The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Jul. 18, 2017
Applicant:

Fujitsu Limited, Kawasaki-shi, Kanagawa, JP;

Inventor:

Shirou Ozaki, Yamato, JP;

Assignee:

FUJITSU LIMITED, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01); H01L 21/28 (2006.01); H01L 29/205 (2006.01); H01L 29/778 (2006.01); H01L 29/417 (2006.01); H01L 29/423 (2006.01); H01L 29/20 (2006.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66522 (2013.01); H01L 21/02241 (2013.01); H01L 21/28264 (2013.01); H01L 21/30612 (2013.01); H01L 29/205 (2013.01); H01L 29/4175 (2013.01); H01L 29/66462 (2013.01); H01L 29/7786 (2013.01); H01L 29/7787 (2013.01); H01L 29/2003 (2013.01); H01L 29/41766 (2013.01); H01L 29/42376 (2013.01); H01L 29/513 (2013.01); H01L 29/517 (2013.01);
Abstract

A semiconductor device includes a first semiconductor layer formed of a compound semiconductor, provided over a substrate; a second semiconductor layer formed of a compound semiconductor including In and Al, provided over the first semiconductor layer; source and drain electrodes provided on the second semiconductor layer; and a gate electrode provided between the source and drain electrodes, on the second semiconductor layer. The compound semiconductor in the second semiconductor layer has a first In composition ratio in a region on a side facing the substrate and a second In composition ratio in a region on an opposite side, the second In composition ratio being lower than the first In composition ratio, and the source and drain electrodes are provided in contact with the region having the first In composition ratio, and the gate electrode is provided on the region having the second In composition ratio.


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