The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Sep. 08, 2017
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventors:

Atsushi Yoshitomi, Tokyo, JP;

Yoshiyuki Kawashima, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/1157 (2017.01); H01L 21/28 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/423 (2006.01); H01L 29/792 (2006.01); H01L 29/40 (2006.01); H01L 29/49 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1157 (2013.01); H01L 21/28282 (2013.01); H01L 29/42344 (2013.01); H01L 29/66833 (2013.01); H01L 29/78 (2013.01); H01L 29/792 (2013.01); H01L 29/408 (2013.01); H01L 29/4983 (2013.01);
Abstract

The reliability and performances of a semiconductor device having a nonvolatile memory are improved. A control gate electrode is formed over a semiconductor substrate via a first insulation film. A memory gate electrode is formed over the semiconductor substrate via a second insulation film having a charge accumulation part. The second insulation film is formed across between the semiconductor substrate and the memory gate electrode, and between the control gate electrode and the memory gate electrode. Between the control gate electrode and the memory gate electrode, a third insulation film is formed between the second insulation film and the memory gate electrode. The third insulation film is not formed under the memory gate electrode. A part of the memory gate electrode is present under the lower end face of the third insulation film.


Find Patent Forward Citations

Loading…