The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Oct. 08, 2014
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Asuka Yoshizumi, Kyoto, JP;

Ayumi Higuchi, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C23F 1/00 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C25F 3/00 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01); H01L 21/687 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67075 (2013.01); H01L 21/02052 (2013.01); H01L 21/30604 (2013.01); H01L 21/31111 (2013.01); H01L 21/6704 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/68714 (2013.01);
Abstract

This substrate processing method includes supplying a chemical liquid to an upper surface of a substrate and rinsing away the chemical liquid adhering to the upper surface of the substrate by holding a puddled rinse liquid on the substrate while maintaining a rotation speed of the substrate at a zero or low speed, and a chemical liquid puddle step of holding a liquid film of a puddled chemical liquid on the upper surface of the substrate while maintaining the rotation speed of the substrate at a zero or low speed, and the rinsing step is performed subsequent to finishing the chemical liquid puddle step, and the rinsing step includes supplying a rinse liquid to the upper surface of the substrate and then replacing the liquid film of the chemical liquid held on the upper surface of the substrate with the rinse liquid.


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