The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Jun. 29, 2015
Phc Holdings Corporation, Tokyo, JP;
Masahiro Johno, Ehime, JP;
Fusatoshi Okamoto, Ehime, JP;
PHC HOLDINGS CORPORATION, Tokyo, JP;
Abstract
A substrate for sample analysis has a rotation axis, a first chamber having a first space for retaining a liquid, a second chamber having a second space for retaining the liquid to be discharged from the first chamber, and a first channel having a path connecting the first chamber and the second chamber. The first space includes a first portion and a second portion, and a coupling portion located between the first and second portions. The substrate includes a wall portion partitioning the first and second portions from each other. The second chamber is more distant from the rotation axis than is the first portion. The coupling portion is closer to the rotation axis than is the wall portion. The second portion at least includes a portion which is more distant from the rotation axis than is the first portion.