The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Feb. 19, 2016
Applicant:

National University Corporation Toyohashi University of Technology, Toyohashi-shi, Aichi, JP;

Inventors:

Fumihiro Dasai, Toyohashi, JP;

Kazuaki Sawada, Toyohashi, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/00 (2006.01); G01N 27/327 (2006.01); G01N 27/414 (2006.01); G01N 33/543 (2006.01); H01L 21/768 (2006.01); H01L 23/532 (2006.01); G01N 21/00 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
G01N 27/3278 (2013.01); G01N 21/00 (2013.01); G01N 27/414 (2013.01); G01N 27/4145 (2013.01); G01N 27/4148 (2013.01); G01N 33/5438 (2013.01); H01L 21/76883 (2013.01); H01L 23/53238 (2013.01); H01L 23/53295 (2013.01); H01L 29/78 (2013.01);
Abstract

Proposed is a device for detecting a chemical/physical phenomenon, in which, via a novel scheme, charges are accumulated in a charge accumulation region. An amount of charges thus accumulated reflects the potential of a sensing region and the potential corresponds to an external environment (chemical phenomenon or physical phenomenon) to be detected. A charge accumulation regionincludes a first potential well region FDthat is continuous with a sensing region, the boundary potential of the charges held in the first potential well region FDbeing made equal to the potential of the sensing region, whereby the potential of the sensing regionis made to be reflected in the amount of charges held in the first potential well region FD


Find Patent Forward Citations

Loading…