The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Sep. 23, 2016
Honeywell Limited, Mississauga, CA;
Ning He, Edmonton, CA;
Xiaotao Liu, Edmonton, CA;
Michael Forbes, North Vancouver, CA;
Johan Backstrom, North Vancouver, CA;
Tongwen Chen, Edmonton, CA;
Honeywell International Inc., Morris Plains, NJ (US);
Abstract
Automated parameter tuning techniques for cross-directional model predictive control for paper-making under user-specified parametric uncertainties are developed. The CD-MPC design explicitly accounts for parametric model uncertainty while finding a value for the CD profile trajectory generation that minimizes the CD settling time of the measurement 2 sigma spread and does not exceed an overshoot limit for actuator 2 sigma spread. The inventive technique includes: (i) providing uncertainty specifications for the temporal parameters of the process model, (ii) specifying 2 sigma overshoot limits for the CD actuator profile, (iii) using robust stability theory to find a minimum bound for the profile trajectory tuning parameter, (iv) using a frequency domain technique to reduce the search range for the profile trajectory tuning parameter, and (v) performing an intelligent search for the tuning parameter that minimizes measurement 2 sigma settling time without exceeding the actuator 2 sigma overshoot limit.