The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Nov. 06, 2014
Applicant:

Sicpa Holding SA, Prilly, CH;

Inventors:

Sabine Mayade, Thonon les Bains, FR;

Tristan Jauzein, Vevey, CH;

Assignee:

SICPA HOLDING SA, Prilly, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 19/02 (2006.01); C09K 19/42 (2006.01); C09K 19/32 (2006.01); C09K 19/34 (2006.01); B42D 25/364 (2014.01); B41M 3/14 (2006.01); C09K 19/38 (2006.01); B41M 5/28 (2006.01); C09K 19/54 (2006.01); C09K 19/04 (2006.01);
U.S. Cl.
CPC ...
C09K 19/3852 (2013.01); B41M 5/281 (2013.01); B42D 25/364 (2014.10); C09K 19/02 (2013.01); C09K 19/38 (2013.01); C09K 19/3861 (2013.01); C09K 19/542 (2013.01); B41M 3/14 (2013.01); C09K 2019/0448 (2013.01); C09K 2019/3408 (2013.01); C09K 2219/03 (2013.01);
Abstract

Disclosed is a substrate which has thereon a marking or layer comprising a cured chiral liquid crystal precursor composition which does not contain any salt that would change the position of a selective reflection band exhibited by the cured composition. A modifying resin made from one or more polymerizable monomers comprising an average of at least one ether functionali typer polymerizable group is disposed between the substrate and the marking or layer and in contact with the marking or layer in one or more areas thereof. The modifying resin changes the position of a selective reflection band exhibited by the cured chiral liquid crystal precursor composition on the substrate in the one or more areas.


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