The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Sep. 01, 2014
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Jeong Ae Yoon, Daejeon, KR;

Su Jeong Kim, Daejeon, KR;

Sung Soo Yoon, Daejeon, KR;

Min Ki Lee, Daejeon, KR;

Kee Young Kim, Daejeon, KR;

Han Na Chi, Daejeon, KR;

Sang Hyun Hong, Daejeon, KR;

Jeong Sik Bae, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 293/00 (2006.01); C08F 220/18 (2006.01); C09D 153/00 (2006.01); C09J 153/00 (2006.01); C08J 5/18 (2006.01); C09J 7/24 (2018.01);
U.S. Cl.
CPC ...
C08F 293/00 (2013.01); C08F 220/18 (2013.01); C08F 293/005 (2013.01); C08J 5/18 (2013.01); C09D 153/00 (2013.01); C09J 7/24 (2018.01); C09J 153/00 (2013.01); C09J 153/005 (2013.01); C08F 2438/01 (2013.01); C08J 2353/00 (2013.01); C09J 2201/606 (2013.01); C09J 2433/006 (2013.01); C09J 2453/00 (2013.01);
Abstract

A block copolymer, a method for preparing a block copolymer, a resin composition, and a film are provided. The block copolymer can be useful in inhibiting complete separation of the hard segment even under a severe high-temperature condition by increasing the chemical cross-linking density around the hard segment without causing an increase in glass transition temperature of the hard segment, thereby maintaining high-temperature durability.


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