The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2019

Filed:

Mar. 02, 2018
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Archana Venugopal, Dallas, TX (US);

Luigi Colombo, Dallas, TX (US);

Arup Polley, Richardson, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0312 (2006.01); H01L 29/786 (2006.01); H01L 29/20 (2006.01); H01L 29/267 (2006.01); H01L 29/49 (2006.01); H01L 29/45 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 21/8258 (2006.01); H01L 27/092 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78696 (2013.01); H01L 21/0254 (2013.01); H01L 21/02527 (2013.01); H01L 21/02614 (2013.01); H01L 21/8258 (2013.01); H01L 27/092 (2013.01); H01L 29/1606 (2013.01); H01L 29/2003 (2013.01); H01L 29/267 (2013.01); H01L 29/45 (2013.01); H01L 29/4908 (2013.01); H01L 29/66742 (2013.01); H01L 29/78618 (2013.01); H01L 29/78648 (2013.01); H01L 29/78681 (2013.01); H01L 29/78684 (2013.01); H01L 21/02378 (2013.01); H01L 21/02381 (2013.01); H01L 21/02389 (2013.01); H01L 21/02395 (2013.01); H01L 21/02488 (2013.01);
Abstract

A microelectronic device includes a gated graphene component over a semiconductor material. The gated graphene component includes a graphitic layer having at least one layer of graphene. The graphitic layer has a channel region, a first connection and a second connection make electrical connections to the graphitic layer adjacent to the channel region. The graphitic layer is isolated from the semiconductor material. A backgate region having a first conductivity type is disposed in the semiconductor material under the channel region. A first contact field region and a second contact field region are disposed in the semiconductor material under the first connection and the second connection, respectively. At least one of the first contact field region and the second contact field region has a second, opposite, conductivity type. A method of forming the gated graphene component in the microelectronic device with a transistor is disclosed.


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