The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2019

Filed:

Dec. 08, 2016
Applicant:

Tdk Corporation, Minato-ku, Tokyo, JP;

Inventors:

Tsutomu Okabe, Tokyo, JP;

Hidetoshi Horibe, Tokyo, JP;

Assignee:

TDK CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/673 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67017 (2013.01); H01L 21/02046 (2013.01); H01L 21/67353 (2013.01); H01L 21/67393 (2013.01); H01L 21/67772 (2013.01); H01L 21/67775 (2013.01); B65G 2201/0297 (2013.01);
Abstract

An EFEM includes a wafer transportation part having a wafer transportation room passed by a wafer transported to a processing room and a load port part airtightly connecting a main opening formed on a container housing the wafer to the room. The transportation part includes a downward current forming device for forming a downward current in the room and a current plate arranged in the room and partly introducing the current into the container connected to the room via the opening. The load port part includes an installation stand for installing the container, a bottom nozzle for communicating with a bottom hole formed at a position distant from the opening more than a bottom surface middle on a bottom surface of the container, and a gas discharge passage for discharging a gas in the container to an outside thereof via the nozzle.


Find Patent Forward Citations

Loading…