The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2019
Filed:
Jul. 20, 2017
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Soyoung Park, Gyeongsangnam-do, KR;
Heehwan Kim, Sejong-si, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-Do, KR;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01); B08B 3/04 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/304 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/304 (2013.01); B08B 3/02 (2013.01); B08B 3/047 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); H01L 21/67051 (2013.01); H01L 21/02057 (2013.01); H01L 21/6708 (2013.01); H01L 21/67028 (2013.01); H01L 21/68764 (2013.01);
Abstract
Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a spin head configured to support the substrate, a cup surrounding an outer circumference of the spin head, a first ejection member having a first nozzle configured to discharge a first chemical to the substrate located in the spin head, and a second ejection member having a second nozzle configured to discharge a second chemical of the same chemical composition as that of the first chemical to the substrate located in the spin head.