The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2019

Filed:

Feb. 23, 2015
Applicant:

Futurewei Technologies, Inc., Plano, TX (US);

Inventors:

Jason Yang Sun, Palo Alto, CA (US);

Qingqing Zhou, Santa Clara, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/30 (2006.01); G06F 16/174 (2019.01); G06F 16/18 (2019.01);
U.S. Cl.
CPC ...
G06F 16/174 (2019.01); G06F 16/1858 (2019.01); G06F 17/3015 (2013.01); G06F 17/30224 (2013.01); G06F 17/30584 (2013.01);
Abstract

System and method for hybrid distribution mode in massively parallel processing (MPP) database preventing storage imbalance issues caused by data skew. Key values of the database are identified as outliers if records of those keys cause database skew. In hybrid mode, records having the outlier key values are distributed using a random distribution scheme. Other records are distributed using a hash distribution scheme. A threshold skew amount is configurable for the system. Record lookups, insertions, deletions, and updates are processed according to a query plan optimized for the distribution mode of the records referenced in a database query.


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