The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2019

Filed:

Jun. 08, 2018
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Hiroshi Sato, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 9/02 (2006.01); G03F 7/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); G03F 9/7042 (2013.01); G03F 9/7049 (2013.01); G03F 9/7065 (2013.01); G01J 2009/0234 (2013.01);
Abstract

This disclosure provides an imprint apparatus configured to form a pattern with an imprint material by bringing the imprint material on a substrate and a pattern of the mold into contact with each other including a drive unit to bring part of the pattern of the mold into contact with the imprint material, and bring the pattern into contact with the imprint material so a contact surface area between the pattern of the mold and the imprint material increases, an interference fringe detecting unit to detect an interference fringe generated by reflected light from the pattern of the mold and reflected light from the substrate, and a state detecting unit to detect a contact state between the pattern of the mold and the imprint material on the basis of the interference fringe.


Find Patent Forward Citations

Loading…