The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2019

Filed:

Sep. 30, 2016
Applicant:

Navid Yazdi, Ann Arbor, MI (US);

Inventor:

Navid Yazdi, Ann Arbor, MI (US);

Assignee:

BelluTech LLC, Ann Arbor, MI (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01D 5/12 (2006.01); H01H 1/00 (2006.01); H01H 35/00 (2006.01); G01D 5/251 (2006.01); H01H 35/42 (2006.01); H01H 37/00 (2006.01);
U.S. Cl.
CPC ...
G01D 5/12 (2013.01); G01D 5/251 (2013.01); H01H 1/0036 (2013.01); H01H 35/00 (2013.01); H01H 35/42 (2013.01); H01H 2037/008 (2013.01); H01H 2300/032 (2013.01); Y02B 90/224 (2013.01); Y04S 20/14 (2013.01);
Abstract

Modules, systems, and methods for monitoring environmental conditions, such as physical, electromagnetic, thermal, and/or chemical parameters within an environment, over extended periods of time with the use of one or more electromechanical sensing devices that include a sensing device and electronic circuitry for processing an output of the sensing device and generating a output of the module. The sensing device includes a microstructure, for example, a cantilevered beam, and at least one set of contacts configured for contact-mode operation with the microstructure in response to the microstructure deflecting toward or away from the contacts when exposed to the parameter of interest. The microstructure has a stack of layers of dissimilar materials, at least one of which has at least one property that changes as a result of curing of or absorption by the first material when exposed to the parameter.


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