The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2019
Filed:
Oct. 29, 2015
Wacker Chemie Ag, Munich, DE;
Matthias Vietz, Mattighofen, AT;
Stefan Faerber, Tuessling, DE;
WACKER CHEMIE AG, Munich, DE;
Abstract
Polycrystalline silicon is produced by depositing polycrystalline silicon onto U-shaped slim rods, deinstalling at least one polycrystalline silicon rod pair from the reactor, removing graphite residues from the electrode-side ends of the polycrystalline silicon rods of the polycrystalline silicon rod pair, and comminuting the polycrystalline silicon rods into rod pieces or into chunks, wherein prior to deinstallation of the polycrystalline silicon rod pairs from the reactor, the polycrystalline silicon rod pairs are at least partially with a plastics material bag made of a plastics material film having a thickness of more than 150 μm, wherein the plastics material bag comprises weights at its opening. The invention further relates to a polycrystalline silicon rod pair which has a rod diameter of 190 mm or more and is covered by a plastics material bag made of a plastics material film having a thickness of more than 150 μm.