The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2019
Filed:
Sep. 22, 2017
Apple Inc., Cupertino, CA (US);
Nathan K. Gupta, San Francisco, CA (US);
Simon R. Lancaster-Larocque, San Jose, CA (US);
Prithu Sharma, Cupertino, CA (US);
Weibo Cheng, Santa Clara, CA (US);
Abhijit A. Kangude, Fremont, CA (US);
Bryan W. Posner, San Francisco, CA (US);
Sudirukkuge T. Jinasundera, San Jose, CA (US);
Karan Bir, Waterloo, CA;
Apple Inc., Cupertino, CA (US);
Abstract
A hybrid laser modulation and acid etch process for the creation of a patterned substrate. According to some embodiments, a hole is formed in a glass substrate by first modulating a portion of the substrate in the desired shape. A mask is coated on the glass substrate and is patterned to expose the modulated portion. The glass substrate is then acid etched to remove the modulated portion. Once the modulated portion has been etched, the desired shape may be removed from the glass substrate and the mask may be stripped.