The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2019
Filed:
Nov. 03, 2015
Gwangju Institute of Science and Technology, Gwangju, KR;
Chonnam National University Hospital, Gwangju, KR;
Daegu Gyeongbuk Institute of Science & Technology, Daegu, KR;
Sung-Joon Cho, Gwangju, KR;
Seok-Yong Choi, Gwangju, KR;
Tai-Seung Nam, Gwangju, KR;
Dong-Hak Byun, Gwangju, KR;
So-Hee Kim, Gwangju, KR;
Myeong-Kyu Kim, Gwangju, KR;
GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY, Gwangju, KR;
CHONNAM NATIONAL UNIVERSITY HOSPITAL, Gwangju, KR;
DAEGU GYEONGBUK INSTITUTE OF SCIENCE & TECHNOLOGY, Daegu, KR;
Abstract
The present disclosure relates to a microelectrode for measuring EMG signals of a laboratory microfauna. The present disclosure includes a metal plate with an insulating plate deposited on a surface, a plurality of silicon substrates disposed on the insulating plate, the silicon substrates being electrically connected to the metal plate, covered with an insulator, and adjacent to one another, and a plurality of needle electrodes, each formed on the respective silicon substrates as an integral part thereof, wherein the needle electrodes have the same predetermined length, have a tapered shape from the respective silicon substrates, are spaced apart from each other by a predetermined distance, and wherein a metallic layer is formed on each of the needle electrodes by depositing metal materials, the insulator is formed on the metallic layer, and a portion of the metallic layer at a tip is exposed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile