The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2019

Filed:

Nov. 14, 2016
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventor:

Daigo Sawaki, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/42 (2006.01); H01L 31/10 (2006.01); H01L 27/30 (2006.01); H01L 27/146 (2006.01); H01L 51/44 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 51/4273 (2013.01); H01L 27/14665 (2013.01); H01L 27/307 (2013.01); H01L 31/10 (2013.01); H01L 51/006 (2013.01); H01L 51/0059 (2013.01); H01L 51/0061 (2013.01); H01L 51/0072 (2013.01); H01L 51/0073 (2013.01); H01L 51/442 (2013.01);
Abstract

Provided is a photoelectric conversion element including: a lower electrode, a charge blocking layer which suppresses injection of a charge from the lower electrode, an organic layer which includes a photoelectric conversion layer, and an upper electrode which includes a transparent electrode layer, which are laminated in this order on a substrate. The photoelectric conversion layer is configured of an amorphous film and has a bulk hetero-structure of a P-type organic semiconductor and an N-type organic semiconductor formed of fullerenes. A difference between the ionization potential of the photoelectric conversion layer having the bulk hetero-structure and the electron affinity of the N-type semiconductor is 1.30 eV or greater.


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