The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2019

Filed:

Jul. 21, 2015
Applicant:

Soko Kagaku Co., Ltd., Ishikawa, JP;

Inventors:

Michiko Kaneda, Aichi, JP;

Cyril Pernot, Ishikawa, JP;

Akira Hirano, Aichi, JP;

Assignee:

SOKO KAGAKU CO., LTD., Ishikawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/32 (2010.01); H01L 33/16 (2010.01); H01L 33/00 (2010.01); H01L 33/12 (2010.01); H01L 33/22 (2010.01); H01L 33/06 (2010.01); H01L 33/18 (2010.01); H01L 33/24 (2010.01);
U.S. Cl.
CPC ...
H01L 33/32 (2013.01); H01L 33/007 (2013.01); H01L 33/0025 (2013.01); H01L 33/06 (2013.01); H01L 33/12 (2013.01); H01L 33/16 (2013.01); H01L 33/18 (2013.01); H01L 33/22 (2013.01); H01L 33/24 (2013.01);
Abstract

A nitride semiconductor ultraviolet light-emitting element comprises an underlying portion that includes a substrate that is composed of sapphire and has a surface inclined to a (0001) surface so as to form a multi-step terrace, and an AlN layer formed on a surface of the substrate, and a light-emitting portion that is formed on a surface of the underlying portion and includes an active layer having an AlGaN based semiconductor layer. At least the AlN layer of the underlying portion, the active layer of the light-emitting portion, and each layer between the AlN layer and the active layer are formed by step flow growth in which a side surface of a multi-step terrace grows so as to achieve two-dimensional growth. The active layer has a quantum well structure including at least a well layer composed of AlGaN. The average roughness of a 25 μm by 25 μm region on a surface of the active layer is a thickness of the well layer or more and 10 nm or less.


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