The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2019

Filed:

Jun. 06, 2017
Applicants:

Tsinghua University, Beijing, CN;

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Peng Liu, Beijing, CN;

Wei Zhao, Beijing, CN;

Xiao-Yang Lin, Beijing, CN;

Duan-Liang Zhou, Beijing, CN;

Chun-Hai Zhang, Beijing, CN;

Kai-Li Jiang, Beijing, CN;

Shou-Shan Fan, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 37/16 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/26 (2013.01); H01J 37/16 (2013.01); H01J 37/244 (2013.01); H01J 2237/2443 (2013.01); H01J 2237/24455 (2013.01); H01J 2237/24585 (2013.01); H01J 2237/2602 (2013.01);
Abstract

The disclosure relates to a method for characterizing a two-dimensional nanomaterial sample. The two-dimensional nanomaterial sample is placed in a vacuum chamber. An electron beam passes through the two-dimensional nanomaterial sample to form a diffraction electron beam and a transmission electron beam to form an image on an imaging device. An angle θ between the diffraction electron beam and the transmission electron is obtained. A lattice period d of the two-dimensional nanomaterial sample is calculated according to a formula d sin θ≅dθ=λ, where λ represents a wavelength of the electron beam.


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