The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2019
Filed:
Jan. 31, 2015
Neoperl Gmbh, Mullheim, DE;
Martin Fangmeier, Auggen, DE;
Neoperl GmbH, Müllheim, DE;
Abstract
The present invention relates to a pressure-reducing valve () having a valve housing (), in the housing interior of which is provided a valve carrier () which has at least one through-flow channel (), and having a pot-shaped valve body () which is guided displaceably from an open position into a closed position in opposition to a restoring force, in which closed position the valve body () abuts by way of the circumferential edge () of its pot shape in such a manner against a valve seat (), which is provided on the valve carrier (), that the valve body () closes at least one channel opening () of the at least one through-flow channel (). It is characteristic of the pressure-reducing valve () according to the invention that at least one retaining sleeve (), into which in each case a retaining pin () provided on the valve body () or on the valve carrier () protrudes, is provided on the valve carrier () or on the valve body (), and that a stop (), which interacts with a counter stop () on the outside circumference of the retaining pin () in such a manner that in the open position of the pressure-reducing valve () the stop () and the counter stop () delimit the sliding distance of the valve body () relative to the valve carrier (), is provided on the inside circumference of the retaining sleeve ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile