The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2019
Filed:
Jul. 31, 2018
Applicant:
Postech Academy-industry Foundation, Pohang-si, Gyeongsangbuk-do, KR;
Inventors:
Assignee:
POSTECH ACADEMY-INDUSTRY FOUNDATION, Pohang-si, Gyeongsangbuk-Do, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/20 (2006.01); G03F 7/20 (2006.01); C23C 14/04 (2006.01); B23K 26/362 (2014.01); H01L 21/308 (2006.01); G03F 1/00 (2012.01); B23K 26/06 (2014.01); B23K 26/18 (2006.01); B23K 26/359 (2014.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70733 (2013.01); B23K 26/0661 (2013.01); B23K 26/18 (2013.01); B23K 26/359 (2015.10); B23K 26/362 (2013.01); C23C 14/042 (2013.01); G03F 1/0007 (2013.01); G03F 7/70783 (2013.01); H01L 21/3086 (2013.01); B23K 2103/42 (2018.08); B23K 2103/50 (2018.08);
Abstract
A mask manufacturing apparatus, a method of manufacturing the mask, and a mask for lithography, capable of providing a pattern having a size in nanometer unit using the photo-lithography process are provided. A mask manufacturing apparatus, a method of manufacturing the mask, and an elastic film for a photo-mask lower a critical dimension of the pattern(s) without increasing a manufacturing cost. The mask manufacturing apparatus and the method of manufacturing the mask, and the mask for lithography provide a pattern having a size in nanometer unit using the photo-lithography process.