The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2019
Filed:
Jul. 09, 2014
Dow Global Technologies Llc, Midland, MI (US);
Kaoru Aou, Lake Jackson, TX (US);
Juan Carlos Medina, Lake Jackson, TX (US);
Rajesh P. Paradkar, Lake Jackson, TX (US);
Dwight Latham, Clute, TX (US);
Michelle Tipps-Thomas, Richwood, TX (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
A method for exposing a substrate to water under superatmospheric pressure at a temperature of at least 70° C. includes (a) applying a reaction mixture to a substrate, which reaction mixture has an isocyanate index of at least 10 and includes an aromatic polyisocyanate component, a polyol component having a polyol with a hydroxyl equivalent weight of at least 500, and a catalyst component having an isocyanate trimerization catalyst, and at least partially curing the reaction mixture to form a polyisocyanurate or polyurethane-isocyanurate polymer having a glass transition temperature of at least 80° C., and (b) exposing the substrate and the polyisocyanurate or polyurethane-isocyanurate polymer to water under superatmospheric pressure at a temperature of at least 70° C.