The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2019
Filed:
Jul. 11, 2017
Honeywell International Inc., Morris Plains, NJ (US);
Jong Soo Lee, Cressona, PA (US);
Awdhoot Vasant Kerkar, Rockaway, NJ (US);
Carl Altman, Pitman, PA (US);
Tian Xia, Shanghai, CN;
Takahiro Iwazu, Tokyo, JP;
Hanjin Huang, Shanghai, CN;
HONEYWELL INTERNATIONAL INC., Morris Plains, NJ (US);
Abstract
A film layer and a method of forming a film layer are provided herein. The film layer includes a first polymer and a second polymer. The first polymer includes the reaction product of chlorotrifluoroethene and vinylidene fluoride utilized in the first polymer in an amount of at least 4 wt. %. The second polymer includes the reaction product of chlorotrifluoroethene and optionally, vinylidene fluoride utilized in the second polymer in an amount of less than 4 wt. %. A multilayer film and a method of forming a multilayer film are also provided herein. In an embodiment, a multilayer film includes a first film layer and a second film layer adjacent and sealed to the first film layer. At least one of the first film layer or the second film layer includes the first polymer and the second polymer.