The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2019

Filed:

Jan. 28, 2016
Applicants:

Institute of Process Engineering, Chinese Academy of Sciences, Beijing, CN;

Beijing Zhongkaihongde Technology Co., Ltd, Beijing, CN;

Inventors:

Qingshan Zhu, Beijing, CN;

Chuanlin Fan, Beijing, CN;

Wenheng Mu, Beijing, CN;

Jibin Liu, Beijing, CN;

Cunhu Wang, Beijing, CN;

Qixun Ban, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01G 31/02 (2006.01); B01D 3/14 (2006.01); B01D 19/00 (2006.01); B01J 8/24 (2006.01); C01G 31/04 (2006.01);
U.S. Cl.
CPC ...
C01G 31/02 (2013.01); B01D 3/14 (2013.01); B01D 19/0057 (2013.01); B01J 8/24 (2013.01); C01G 31/04 (2013.01); C01P 2006/80 (2013.01);
Abstract

The present invention provides a system and method for purifying vanadium pentoxide. Industrial grade vanadium pentoxide is converted to vanadium oxytrichloride by low temperature fluidizing chlorination, wherein chlorinating gas is preheated via heat exchange between fluidizing gas and chlorination flue gas, and an appropriate amount of air is added to enable a part of carbon powder to combust so as to achieve a balanced heat supply during the chlorination, thereby increasing the efficiency of chlorination and ensuring good selectivity in low temperature chlorination. The vanadium oxytrichloride is purified by rectification, and then subjected to plasma oxidation, thereby obtaining a high-purity vanadium pentoxide product and chlorine gas. The chlorine gas is returned for low temperature chlorination. The system and method have advantages of favorable adaptability to raw material, no discharge of contaminated wastewater, low energy consumption and chlorine consumption in production, stable product quality, etc.


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