The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2019
Filed:
Jul. 07, 2015
Psilox Ab, Uppsala, SE;
Håkan Engqvist, Östhammar, SE;
Other;
Abstract
A cement system for forming an implant comprises a reactive glass ionomer cement (GIC) powder, a polycarboxylic acid or salt, and a filler. The polycarboxylic acid or salt is included to initially provide a paste having a pH less than 7 when the cement system is mixed with water. In one embodiment, the filler is substantially inert when mixed with water and is selected from (CaO)(AIO)6, (CaO)(AIO), calcium silicate (CaOSiO), and mixtures thereof. In another embodiment, the filler is substantially reactive when mixed with water and is selected from (CaO)(SiO), (CaO)(SiO), and mixtures thereof, and the cement system includes an additional acid to maintain the paste at a pH less than 7 for at least one hour after the cement system is mixed with water.