The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2019

Filed:

Oct. 04, 2016
Applicant:

Nikon Corporation, Tokyo, JP;

Inventor:

Kenichi Ishiga, Yokohama, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 13/214 (2018.01); H04N 13/25 (2018.01); H04N 13/257 (2018.01); H04N 13/296 (2018.01); G02B 7/34 (2006.01); G03B 13/36 (2006.01); H04N 5/33 (2006.01); H01L 27/146 (2006.01); H04N 13/207 (2018.01); H04N 13/271 (2018.01); G03B 35/08 (2006.01); G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
H04N 13/214 (2018.05); G02B 7/34 (2013.01); G03B 13/36 (2013.01); H01L 27/14623 (2013.01); H01L 27/14627 (2013.01); H04N 5/33 (2013.01); H04N 13/207 (2018.05); H04N 13/25 (2018.05); H04N 13/257 (2018.05); H04N 13/271 (2018.05); H04N 13/296 (2018.05); G02B 5/201 (2013.01); G03B 35/08 (2013.01);
Abstract

Reception of the invisible light wavelength band in an incident luminous flux has not been considered. In view of this, an image sensor is provided, the image sensor including: a visible parallax pixel that is associated with a visible range light-receiving photoelectric conversion pixel having any of a plurality of types of aperture mask each including an aperture that is positioned to allow passage, to a photoelectric converting element, of a mutually different partial luminous flux of an incident luminous flux in a visible light wavelength band; and an invisible parallax pixel that is associated with an invisible range light-receiving photoelectric conversion pixel having any of a plurality of types of aperture mask each including an aperture positioned to allow passage, to the photoelectric converting element, of a mutually different partial luminous flux in an incident luminous flux in an invisible light wavelength band.


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