The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2019

Filed:

Oct. 19, 2016
Applicant:

Ushio Denki Kabushiki Kaisha, Tokyo, JP;

Inventor:

Kohei Miyoshi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/18 (2006.01); C30B 25/20 (2006.01); C30B 29/40 (2006.01); H01L 33/00 (2010.01); H01L 33/18 (2010.01); H01L 33/32 (2010.01); H01L 33/50 (2010.01);
U.S. Cl.
CPC ...
H01L 33/32 (2013.01); C30B 25/183 (2013.01); C30B 29/406 (2013.01); H01L 33/0008 (2013.01); H01L 33/18 (2013.01); H01L 33/502 (2013.01); C30B 25/20 (2013.01);
Abstract

A nitride semiconductor light-emitting element having a main emission wavelength of 520 nm or more, including a sapphire substrate, and a semiconductor layer formed on an upper layer of the sapphire substrate. The semiconductor layer includes: a first semiconductor layer formed on a surface of the sapphire substrate; a second semiconductor layer formed on an upper layer of a first semiconductor layer, and doped with n-type or p-type impurities; an active layer formed on an upper layer of the second semiconductor; and a third semiconductor layer formed on an upper layer of the active layer, and having a different conductivity type than the second semiconductor layer. The thickness X of the sapphire substrate and the thickness Y of the semiconductor layer satisfy the relationship 0.06≤Y/X≤0.12.


Find Patent Forward Citations

Loading…