The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2019
Filed:
Feb. 15, 2017
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Keiji Iwata, Kyoto, JP;
Hiroki Tsujikawa, Kyoto, JP;
Shotaro Tsuda, Kyoto, JP;
Seiji Ano, Kyoto, JP;
Assignee:
SCREEN Holdings Co., Ltd, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); C11D 11/00 (2006.01); C11D 7/08 (2006.01); G03F 7/42 (2006.01); H01L 21/306 (2006.01); B08B 3/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31133 (2013.01); B08B 3/041 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); C11D 7/08 (2013.01); C11D 11/0047 (2013.01); G03F 7/423 (2013.01); H01L 21/02057 (2013.01); H01L 21/30604 (2013.01); H01L 21/6708 (2013.01); H01L 21/67051 (2013.01); B08B 2203/005 (2013.01); B08B 2203/007 (2013.01);
Abstract
A substrate treatment method is used for removing a resist from a front surface of a substrate. A substrate treatment apparatus includes a substrate holding unit which holds the substrate, and a sulfuric acid ozone/water mixture supplying unit which supplies a sulfuric acid ozone/water mixture to the front surface of the substrate held by the substrate holding unit, the sulfuric acid ozone/water mixture being a mixture which is prepared by a method including mixing water with sulfuric acid ozone prepared by dissolving ozone gas in sulfuric acid.