The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2019
Filed:
Jul. 10, 2015
Applicant:
Nikon Corporation, Tokyo, JP;
Inventors:
Alton Phillips, Oro Valley, AZ (US);
Yuichi Shibazaki, Kumagaya, JP;
Assignee:
NIKON CORPORATION, , JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/703 (2013.01); G03F 7/707 (2013.01); G03F 7/70783 (2013.01);
Abstract
A scanning lithography tool that includes a reticle stage for clamping and imparting a bending moment onto a reticle by applying a force along a plane surface of the reticle to bend the reticle in a deterministic manner.
Phillips, Alton. (2019). Lithography tool having a reticle stage capable of dynamic reticle bending to compensate for distortion (U.S. Patent No. 10289007). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10289007
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile