The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2019

Filed:

Oct. 29, 2015
Applicant:

Wenzhou Medical University, Wenzhou, Zhejiang, CN;

Inventor:

Min Xu, Sunnyside, NY (US);

Assignee:

WENZHOU MEDICAL UNIVERSITY, Wenzhou, Zhejiang, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/47 (2006.01); G01N 21/55 (2014.01); A61B 5/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/55 (2013.01); A61B 5/00 (2013.01); A61B 5/0075 (2013.01); G01N 21/4738 (2013.01); G01N 21/4795 (2013.01); A61B 5/0059 (2013.01);
Abstract

A light reflection imaging method for acquiring optical parameters and microstructures of tissues in a large area, comprising a turbid medium reflectance calculation method applicable at a random spatial distance and in an entire spatial frequency domain, and a method of measuring the reflectance of a turbid medium at high and low spatial frequencies and inverting the obtained light reflectance to obtain optical parameters of the medium. The inversion method may be a table lookup method or a formula fitting method. The measurement of sub-diffuse and diffuse light reflectance of the turbid medium can be used for measuring the optical properties of the turbid medium and microstructures including a phase function and the like in a large area.


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