The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2019
Filed:
Jun. 12, 2018
Applicant:
Apple Inc., Cupertino, CA (US);
Inventors:
Zafrir Mor, Ein Habsor, IL;
Boris Morgenstein, Tel Aviv, IL;
Assignee:
APPLE INC., Cupertino, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); G01B 11/25 (2006.01); G02B 5/18 (2006.01); H01S 5/00 (2006.01); H01S 5/42 (2006.01); G02B 27/20 (2006.01); G02B 27/42 (2006.01); G06K 9/20 (2006.01); G06F 3/03 (2006.01); G06F 3/042 (2006.01); G06K 9/00 (2006.01); H01S 5/022 (2006.01); F21Y 115/10 (2016.01);
U.S. Cl.
CPC ...
G01B 11/2513 (2013.01); G02B 27/1093 (2013.01); G02B 27/20 (2013.01); G02B 27/4205 (2013.01); G06F 3/0304 (2013.01); G06F 3/042 (2013.01); G06K 9/00201 (2013.01); G06K 9/2036 (2013.01); H01S 5/005 (2013.01); H01S 5/423 (2013.01); F21Y 2115/10 (2016.08); G06K 2209/401 (2013.01); H01S 5/02288 (2013.01);
Abstract
An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.