The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2019

Filed:

Aug. 27, 2015
Applicant:

Tokuyama Corporation, Shunan-shi, JP;

Inventors:

Ken Yasumura, Shunan, JP;

Shoji Tachibana, Shunan, JP;

Assignee:

Tokuyama Corporation, Shunan-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 29/06 (2006.01); C30B 15/04 (2006.01); C30B 25/00 (2006.01); C30B 15/22 (2006.01); C30B 15/00 (2006.01); C30B 35/00 (2006.01); H01L 31/18 (2006.01); C30B 28/14 (2006.01); C01B 33/02 (2006.01); C01B 33/035 (2006.01); H01L 31/028 (2006.01);
U.S. Cl.
CPC ...
C30B 15/04 (2013.01); C30B 15/00 (2013.01); C30B 15/22 (2013.01); C30B 25/00 (2013.01); C30B 29/06 (2013.01); C30B 35/007 (2013.01); H01L 31/1804 (2013.01); C01B 33/02 (2013.01); C01B 33/035 (2013.01); C30B 28/14 (2013.01); H01L 31/028 (2013.01); Y02E 10/547 (2013.01); Y02P 70/521 (2015.11);
Abstract

In a process for producing a silicon single crystal in which carbon is incorporated in order to inhibit crystal defects, provided is a process which easily allows carbon to be mixed and dissolved into a silicon melt. The process for producing a silicon single crystal, which involves allowing a silicon single crystal to grow during its pulling-up from the silicon melt held in a crucible, uses as at least part of a silicon raw material, crushed materials of a polycrystalline silicon rod produced by Siemens process that are obtained by crushing an end of the rod in the vicinity contacting a carbon core wire holding member.


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