The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2019
Filed:
May. 17, 2016
Applicant:
Samsung Display Co., Ltd., Yongin-si, KR;
Inventor:
Jiyun Chun, Yongin-si, KR;
Assignee:
Samsung Display Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/066 (2014.01); B23K 26/386 (2014.01); B23K 26/384 (2014.01); C23F 1/02 (2006.01); C23C 14/04 (2006.01); B23K 26/06 (2014.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); B23K 26/0661 (2013.01); B23K 26/384 (2015.10); B23K 26/386 (2013.01); C23F 1/02 (2013.01);
Abstract
A method of manufacturing a mask includes forming a first protection layer on a first surface of a mask member, the first protection layer comprising first through-holes exposing portions of the first surface; radiating, through the first through-holes, a laser beam onto the exposed portions of the first surface to form blind holes in the mask member; and providing an etchant to form second through-holes in the mask member, the second through-holes comprising the blind bores and extending from the first surface to a second surface of the mask member opposing the first surface.