The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2019

Filed:

Feb. 10, 2016
Applicant:

3m Innovative Properties Company, St. Paul, MN (US);

Inventors:

Susan E. DeMoss, Stillwater, MN (US);

Jonathan D. Zook, Stillwater, MN (US);

Matthew Capel, Huntington Beach, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 75/00 (2006.01); C08G 75/02 (2016.01); C08G 75/04 (2016.01); C08G 75/12 (2016.01); C08L 81/00 (2006.01); C08L 81/02 (2006.01); C07C 321/18 (2006.01); C07C 323/14 (2006.01); C09J 181/02 (2006.01);
U.S. Cl.
CPC ...
C09J 181/02 (2013.01); C07C 321/18 (2013.01); C07C 323/14 (2013.01); C08G 75/00 (2013.01); C08G 75/02 (2013.01); C08G 75/04 (2013.01); C08G 75/12 (2013.01); C08L 81/00 (2013.01); C08L 81/02 (2013.01);
Abstract

Polythioether polymers, sealants containing polythioether polymers, and compounds useful as stabilizing monomers in the manufacture of polythioether polymers are provided. In many embodiments the polymers and sealants demonstrate reduced risk of spoilage that may be caused by low temperature storage of the polymer or uncured sealant. Compounds useful as stabilizing monomers include compounds according to formula I: CH═CR—CHR—S—R—S—CHR—CR═CH[I] wherein R, R, Rand Rare independently selected from —H, —CHor —CH, and wherein Ris selected from divalent groups comprising 2-12 carbon atoms, 0-5 ether oxygen atoms and 0-5 thioether sulfur atoms, which may be straight, branched or cyclic.


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