The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2019
Filed:
Oct. 16, 2013
Lawrence Livermore National Security, Llc, Livermore, CA (US);
Rebecca Dylia-Spears, Dublin, CA (US);
Michael Feit, Livermore, CA (US);
Phillip E. Miller, Livermore, CA (US);
William A. Steele, Tracy, CA (US);
Tayyab I. Suratwala, Pleasanton, CA (US);
Lana L. Wong, Pleasanton, CA (US);
Lawrence Livermore National Security, LLC, Livermore, CA (US);
Abstract
A method for chemically stabilizing polishing slurries in aqueous suspension to prevent their agglomeration while maintaining their surface activity is disclosed. The method prevents the formation of irreversible particle agglomerates during drying and permits the subsequent re-suspension of dried particles with no impact on the particle size distribution. The stabilization method can be customized based on knowledge of the colloid surface charge at suspension pH conditions, addition of a charged species having like charge to the colloid at the suspension conditions, and control of the concentrations of the charged species and other ions in suspension.