The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

Oct. 06, 2017
Applicant:

Ipg Photonics Corporation, Oxford, MA (US);

Inventors:

Manuel J. Leonardo, San Francisco, CA (US);

Mark A. Arbore, Los Altos, CA (US);

Gregory L. Keaton, San Francisco, CA (US);

Assignee:

IPG PHOTONICS CORPORATION, Oxford, ME (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/10 (2006.01); H01S 3/00 (2006.01); G02F 1/35 (2006.01); H01S 3/108 (2006.01); H01S 3/109 (2006.01); H01S 3/067 (2006.01); G02F 1/37 (2006.01); H01S 3/16 (2006.01);
U.S. Cl.
CPC ...
H01S 3/10092 (2013.01); G02F 1/353 (2013.01); H01S 3/0092 (2013.01); H01S 3/108 (2013.01); H01S 3/109 (2013.01); H01S 3/10084 (2013.01); G02F 2001/3503 (2013.01); G02F 2001/354 (2013.01); G02F 2001/3507 (2013.01); G02F 2001/3509 (2013.01); G02F 2001/372 (2013.01); H01S 3/067 (2013.01); H01S 3/06754 (2013.01); H01S 3/06758 (2013.01); H01S 3/1666 (2013.01);
Abstract

A laser system includes a seed source optically coupled to an extra cavity harmonic generator system may produce a round, non-astigmatic third harmonic output beam from a nominally round, non-astigmatic, diffraction limited input fundamental beam from the seed source. The system may include a second harmonic generation crystal. An input fundamental beam size is expanded in a non-walkoff direction for the SHG crystal at the SHG crystal input face. A higher harmonic generation crystal has an output face oriented at an oblique angle of incidence in a non-walkoff direction for the HHG crystal such that an output higher harmonic beam size is contracted in this direction. Expansion of the input fundamental beam at the SHG crystal input face exceeds reduction of third harmonic beam at the HHG crystal output face.


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