The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

Jun. 03, 2016
Applicant:

Japan Display Inc., Tokyo, JP;

Inventors:

Isao Suzumura, Tokyo, JP;

Norihiro Uemura, Tokyo, JP;

Takeshi Noda, Tokyo, JP;

Hidekazu Miyake, Tokyo, JP;

Yohei Yamaguchi, Tokyo, JP;

Assignee:

Japan Display Inc., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); H01L 29/786 (2006.01); H01L 27/12 (2006.01); G02F 1/1333 (2006.01); G02F 1/1337 (2006.01); G02F 1/1343 (2006.01); G02F 1/1368 (2006.01); H01L 29/24 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78696 (2013.01); G02F 1/1337 (2013.01); G02F 1/1368 (2013.01); G02F 1/133345 (2013.01); G02F 1/133512 (2013.01); G02F 1/133514 (2013.01); G02F 1/134309 (2013.01); H01L 27/1225 (2013.01); H01L 27/1285 (2013.01); H01L 29/24 (2013.01); H01L 29/7869 (2013.01); H01L 29/78606 (2013.01); H01L 29/78618 (2013.01); H01L 29/78633 (2013.01); H01L 29/78693 (2013.01); G02F 2001/133357 (2013.01);
Abstract

A thin film transistor includes a first oxide semiconductor, a source electrode, a drain electrode, a gate insulating film and a gate electrode. A second oxide semiconductor layer is between the first oxide semiconductor layer and the source electrode. A third oxide semiconductor layer is between the first oxide semiconductor layer and the drain electrode. The content ratio of oxygen/Indium in each of the second semiconductor layer and the third oxide semiconductor layer is equal to or larger than that of the first semiconductor layer. A thickness of each of the second semiconductor layer and the third oxide semiconductor layer is bigger than that of the first semiconductor layer.


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