The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

Aug. 08, 2017
Applicant:

Toyota Jidosha Kabushiki Kaisha, Toyota-shi, Aichi, JP;

Inventors:

Hidemoto Tomita, Toyota, JP;

Masakazu Kanechika, Nagakute, JP;

Hiroyuki Ueda, Nagakute, JP;

Tomohiko Mori, Nagakute, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 29/66 (2006.01); C30B 25/02 (2006.01); C30B 29/40 (2006.01); H01L 29/778 (2006.01); H01L 29/78 (2006.01); H01L 29/10 (2006.01); H01L 29/737 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66916 (2013.01); C30B 25/02 (2013.01); C30B 29/406 (2013.01); H01L 21/0243 (2013.01); H01L 21/0254 (2013.01); H01L 21/02381 (2013.01); H01L 21/02458 (2013.01); H01L 21/02576 (2013.01); H01L 21/02579 (2013.01); H01L 29/1095 (2013.01); H01L 29/66242 (2013.01); H01L 29/66522 (2013.01); H01L 29/66712 (2013.01); H01L 29/7788 (2013.01); H01L 29/7802 (2013.01); H01L 29/7832 (2013.01); H01L 29/1066 (2013.01); H01L 29/2003 (2013.01); H01L 29/737 (2013.01); H01L 29/7787 (2013.01);
Abstract

A semiconductor device may include a nitride semiconductor layer, an insulation gate section, and a heterojunction region, wherein the nitride semiconductor layer may include an n-type vertical drift region, a p-type channel region adjoining the vertical drift region, and an n-type source region separated from the vertical drift region by the channel region, wherein the insulation gate section is opposed to a portion of the channel region that separates the vertical drift region and the source region, the heterojunction region is in contact with at least a part of a portion of the vertical drift region that is disposed at the one of main surfaces, and the heterojunction region is an n-type nitride semiconductor or an i-type nitride semiconductor having a bandgap wider than a bandgap of the vertical drift region.


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