The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

Jan. 05, 2018
Applicant:

University of Florida Research Foundation, Incorporated, Gainesville, FL (US);

Inventors:

Swarup Bhunia, Gainesville, FL (US);

Haoting Shen, Tallahassee, FL (US);

Mark M. Tehranipoor, Gainesville, FL (US);

Domenic J. Forte, Gainesville, FL (US);

Navid Asadizanjani, Gainesville, FL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); B81B 7/00 (2006.01); H01L 23/522 (2006.01); H01L 23/525 (2006.01); H01L 23/532 (2006.01); H01H 59/00 (2006.01); H01H 29/02 (2006.01); H01L 23/528 (2006.01);
U.S. Cl.
CPC ...
H01L 23/573 (2013.01); B81B 7/0012 (2013.01); H01H 29/02 (2013.01); H01H 59/0009 (2013.01); H01L 23/525 (2013.01); H01L 23/528 (2013.01); H01L 23/5228 (2013.01); H01L 23/5252 (2013.01); H01L 23/53238 (2013.01); B81B 2201/01 (2013.01); B81B 2201/014 (2013.01); B81B 2201/018 (2013.01); B81B 2207/07 (2013.01);
Abstract

A semiconductor device can include a first metal trace, a first via disposed on the first metal trace, a second metal trace disposed on the first via, and an insulator interposed between the first metal trace and the first via. The insulator can be configured to lower an energy barrier or redistribute structure defects or charge carriers, such that the first metal trace and the first via are electrically connected to each other when power is applied. The semiconductor device can further include a dummy via disposed on the first metal trace.


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